Author: David Blackman
Date: 21:31:22 12/02/99
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On December 02, 1999 at 22:01:35, Robert Hyatt wrote: >But a factor of 1000 is probably way high, as I don't think anyone could >(at present) make a transistor that much smaller, since current technology >uses a photographic process... a transistor that small is such a small fraction >of the wavelength of light that it would be impossible to produce... at least >today... I don't think they use photographic etching anymore, at least for state of the art stuff. These days the design rules vary from about 0.11 micron to 0.35 micron. The minimum light wavelength you can use for this is about 0.4 micron otherwise you get lots of secondary electrons messing things up at etch time. I haven't been following it much lately, but it suspect it's mostly electron beam etching now. Anyone know?
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