Author: Dann Corbit
Date: 21:43:34 12/02/99
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On December 03, 1999 at 00:31:22, David Blackman wrote: >On December 02, 1999 at 22:01:35, Robert Hyatt wrote: > >>But a factor of 1000 is probably way high, as I don't think anyone could >>(at present) make a transistor that much smaller, since current technology >>uses a photographic process... a transistor that small is such a small fraction >>of the wavelength of light that it would be impossible to produce... at least >>today... > >I don't think they use photographic etching anymore, at least for state of the >art stuff. These days the design rules vary from about 0.11 micron to 0.35 >micron. The minimum light wavelength you can use for this is about 0.4 micron >otherwise you get lots of secondary electrons messing things up at etch time. > >I haven't been following it much lately, but it suspect it's mostly electron >beam etching now. Anyone know? I thought it was x-rays, but I have not been paying attention.
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